| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment device capable of securing high throughput and high precision alignment, even when using EUV light. <P>SOLUTION: The alignment device is constituted so as to align a mask stage for holding a mask with an exposure pattern which is illuminated, by using the light of no less than 1nm and no more than 50nm wavelength, and a wafer stage for holding the body to be exposed. It comprises a substrate, wherein a second reference pattern is formed in a similar shape to a first reference pattern used for alignment, while being formed in the mask or the mask stage, and a detector for detecting the light which is reflected or transmitted by the substrate. The alignment device is characteristically constituted, such that the substrate and the detector may form a hollow case where gas is introduced into the inside. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
