| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus which can prevent the deterioration of the accuracy of an exposure pattern transferred to a substrate by exposure by preventing the deviation of a mask sucked and held by a mask holding frame. <P>SOLUTION: The proximity exposure apparatus comprises a mask deviation preventive mechanism 40 which prevents the lateral deviation of the mask M sucked and held by a mask suction plate 26. The mask deviation preventive mechanism comprises a presser plate 42 arranged on the bottom face of the mask suction plate, a presser plate moving mechanism 44 which moves the presser plate toward the end face of the mask, and a presser plate suction mechanism which allows the presser plate abutted against the end face of the mask to be sucked and held by the mask suction plate. After the presser plate abuts against the end face of the mask, the presser plate moving mechanism cancels a pressing force acting on the presser plate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
