| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can accurately set a discharge amount of a treatment liquid and easily change the discharge operation of the treatment liquid from a nozzle. SOLUTION: A control part 13 has recipe data and a sub-library. Into the sub-library, a driving pattern, an acceleration and deceleration time of a pump driving motor 7, and a discharge speed and a discharge amount of a resist liquid from a resist nozzle 4 are inputted. Into the recipe data, control information such as the discharge time of the resist nozzle 4 and the like is inputted from an input part 12 and stored. Furthermore, each control information of the recipe data and the sub-library can be changed from the input part 12. If an operator inputs from an input unit 12 at least four pieces of control information among five pieces of the control information of the discharge amount, the discharge speed and the discharge time of the resist liquid 9, the acceleration time and the deceleration time, the control part 13 computes the rest of the control information on the basis of four input pieces of control information. COPYRIGHT: (C)2006,JPO&NCIPI
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