COMPOSITION FOR FORMING INSULATING FILM, INSULATING FILM AND METHOD OF FORMING IT

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a film suitably used in a semiconductor element etc. and to provide an insulating film and a method of forming it. SOLUTION: The composition for forming the insulating film contains a compound obtained by mixing (A) a polyorganosiloxane compound having an MFI structure of a zeolite in which a nitrogen-containing compound exists in a hole formed of 10 member rings of a siloxane for constituting the MFI and (B) a polycarbosilane compound in the presence of an organic solvent and heating it. COPYRIGHT: (C)2006,JPO&NCIPI