| 摘要 |
PROBLEM TO BE SOLVED: To provide a precise, inexpensive, and efficient endpoint detecting method and device for plasma cleaning treatment. SOLUTION: The endpoint detecting device monitors at least any one of a time-based change in the degree of opening of a pressure control valve keeping the inner pressure of a chamber constant, a time-based change in the bias voltage value of a board electrode, and a time-based change in the voltage value of an antenna emitting high-frequency radio waves into the chamber. The device detects the point that the degree of opening or the voltage value stop changing at a certain value, and determines the point to be the endpoint of the cleaning treatment. This enables precise, inexpensive, and efficient endpoint detection. COPYRIGHT: (C)2006,JPO&NCIPI
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