发明名称 Optical semiconductor device and method of fabricating optical semiconductor device
摘要 In an optical semiconductor device including, at least, an n-type semiconductor layer having n-type conductivity, an active layer, a p-type semiconductor layer having p-type conductivity, current blocking layers doped with Fe are located on opposite sides of the p-type semiconductor layer. Fe and Be are simultaneously supplied as dopants when forming the p-type semiconductor layer. In this event, the flow rates of source materials supplying the respective elements are adjusted so that the p-type semiconductor layer has a hole concentration of about 1.0x10<SUP>18</SUP>/cm<SUP>3 </SUP>and an Fe concentration of about 2x10<SUP>16 </SUP>to 8x10<SUP>16</SUP>/cm<SUP>3</SUP>.
申请公布号 US2006054916(A1) 申请公布日期 2006.03.16
申请号 US20050135323 申请日期 2005.05.24
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HANAMAKI YOSHIHIKO
分类号 H01L21/00;H01L31/10;H01S5/227;H01S5/323 主分类号 H01L21/00
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