THE METHOD FOR PRODUCING THIN FILM OR POWDER ARRAY USING LIQUID SOURCE MISTED CHEMICAL DEPOSITION PROCESS

摘要

Producing a thin film or powder array (I) by a liquid source misted chemical deposition process comprising melting a metal precursor into a solvent and producing two or more types of metal precursor liquids; producing droplets by applying high frequency to one of the liquid; transferring the droplets into a vacuum chamber; depositing the droplets on a substrate by a shutter or a moving mask; and thermo-processing the droplets, is new. Producing a thin film or powder array (I) by a liquid source misted chemical deposition process comprising: (a) melting a metal precursor (consisting of a material or catalyst) into a solvent and producing two or more types of metal precursor liquid; (b) selecting one type of liquid; (c) putting it into a reactor and producing droplets by applying high frequency to the liquid; transferring the droplets into a vacuum chamber at a given pressure; (d) depositing the droplets on each area of a substrate to have a concentration gradient by means of a shutter or a moving mask; (e) producing (I) with the droplets by thermal treatment process; and (f) repeating the process for different liquids produced to produce the thin film or powder.