RESIST COMPOSITION USED FOR PROCESSING WITH CHARGED PARTICLE BEAM

摘要

PURPOSE:To obtain satisfactory electrical conductivity and to prevent the accumulation of electric charges by blending a radiation-sensitive resin compsn. with at least one of a specified ionic org. compd. and a specified org. compd. having a pi electron system. CONSTITUTION:A radiation-sensitive resin compsn. is blended with at least one of an ionic org. compd. not reactive with a radiation-sensitive compd. in the compsn. and an org. compd. having a pi electron system in which pi electrons are present nonlocally in the range of >=14 atoms. The ionic org. compd. may be a basic dye or a quat. ammonium salt. The org. compd. having the pi electron system may be perylene, pyrene or porphyrin. Satisfactory electrical conductivity is obtd. and the accumulation of electric charges on a resist can be prevented.