发明名称 Equipment for heating and cooling substrates for coating photo resist thereto
摘要 Equipment for cooling semi-conductor substrates and printed circuit boards after coating photo resist thereon including heating the substrate for treatment. A heating block furnished with a heating plate is provided in a holding frame device on which the substrate is placed and is so mounted that the heating block can be elevated and lowered vertically therein. The heating block further includes a cooling block having a cooling plate which can be reciprocated from one open side of the holding frame device to the interior thereof, the cooling plate being vertically elevated and lowered in the holding frame equipment when the cooling block is in the holding frame device.
申请公布号 US4863547(A) 申请公布日期 1989.09.05
申请号 US19880197883 申请日期 1988.05.24
申请人 TAZMO CO., LTD. 发明人 SHIDAHARA, HITOSHI;YAMAMOTO, SYOZI
分类号 H01L21/304;B05C9/14;G03F7/16;G03F7/38;H01L21/027;H05K3/06 主分类号 H01L21/304
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