| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
<p>An array of individually controllable elements, comprising a plurality of control areas (20) consisting of a plurality of rows (31,32,33,34) of reflectors. Alternate rows (31,33) of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.
</p> |
| 申请公布号 |
EP1628162(A3) |
申请公布日期 |
2006.03.15 |
| 申请号 |
EP20050254919 |
申请日期 |
2005.08.05 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BASELMANS, JOHANNES JACOBUS MATHEUS;BLEEKER, ARNO JAN;DE JAGER, PIETER WILLEM HERMAN;TROOST, KARS ZEGER |
| 分类号 |
G03F7/20;G02B5/18;G02B26/08 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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