发明名称 |
Method for the plasma-activated reactive deposition of electrically conductive multicomponent material from a gas phase |
摘要 |
Electrically conductive multicomponent material is deposited on a tubular substrate (3) by means of a PCVD method. A plasma (9) is produced between an inner electrode (13) and an outer electrode, one of which is tubular and serves as a substrate. In order to obtain multicomponent material of the desired composition, the composition of the gas phase is changed as a function of time and/or place. In particular when metalorganic starting compounds are used, PCVD of many single layers together with an intermittent, for example, Ar/O2 plasma intermediate treatment yields an efficient removal of undesired carbon or fluorine from the deposited multicomponent material already during its manufacture.
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申请公布号 |
US4965090(A) |
申请公布日期 |
1990.10.23 |
申请号 |
US19890293168 |
申请日期 |
1989.01.04 |
申请人 |
U.S. PHILIPS CORPORATION |
发明人 |
GAERTNER, GEORG F.;JANIEL, PETER A.;LYDTIN, HANS-JUERGEN |
分类号 |
C23C16/06;C23C16/08;C23C16/18;C23C16/50;C23C16/509;C23C16/52 |
主分类号 |
C23C16/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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