| 摘要 |
An active-radiation-curing liquid crystalline composition is applied to an alignment layer 2 formed on a base 1 , and the liquid crystal alignment is regulated by the application of heat or the like, thereby forming a liquid crystal layer 3 having cholesteric regularity (FIG. 1 (a)). Next, active radiation 4 with a predetermined radiant intensity is applied to the liquid crystal layer 3 through a photomask 10 (FIG. 1 (b)), and this liquid crystal layer 3 is then brought into contact with a solvent 5 (FIG. 1 (c)). As a result, the area 3 b in the liquid crystal layer 3 not irradiated with the active radiation 4 is removed, while the area 3 a in the liquid crystal layer 3 irradiated with the active radiation 4 remains; a semi-cured cholesteric layer 3 ' having therein a predetermined pattern is thus formed (FIG. 1 (d)). Thereafter, active radiation 6 is applied to the surface of the semi-cured cholesteric layer 3 ' to form a curing rate gradient in the semi-cured cholesteric layer 3 ' between the substrate 9 side surface and the surface opposite to it and cure, while retaining this curing rate gradient, the semi-cured cholesteric layer 3 ' to broaden its selective reflection wave range (FIG. 1 (e)). Lastly, the semi-cured cholesteric layer 3 ' is cured by the application of active radiation 8 while retaining the cholesteric regularity which the semi-cured cholesteric layer 3 ' has developed in the course of broadening of its selective reflection wave range, thereby obtaining a cured cholesteric layer 3 '' (FIG. 1 (f)).
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