发明名称 Concentration profile on demand gas delivery system (individual divert delivery system)
摘要 Apparatus and method for delivering processing gas are provided. The apparatus for delivering processing gas from a vaporizer to a processing system comprises: a valve connected between the vaporizer and the processing system, the valve having a valve input connected to a vaporizer output and a first valve output connected to a processing system input and a second valve output connected to a bypass line; and a controller for switching the valve between the first valve output and the second valve output. The apparatus may further comprise: a second valve connected between a carrier gas source, a divert gas source and the vaporizer, the second valve having a first valve input connected to the carrier gas source, a second valve input connected to the divert gas source, and a valve output connected to a vaporizer input.
申请公布号 US7011710(B2) 申请公布日期 2006.03.14
申请号 US20010832168 申请日期 2001.04.10
申请人 APPLIED MATERIALS INC. 发明人 BANG WON;WANG YEN KUN;KAO YEH JEN
分类号 C23C16/00;C23C16/40;C23C16/44;C23C16/455;C23F1/00;H01L21/306 主分类号 C23C16/00
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