The invention relates to cyclic organometallic compounds which are intramolecularly stabilized and also to their use to produce thin films and epitaxial layers by gas-phase deposition.
申请公布号
US5030741(A)
申请公布日期
1991.07.09
申请号
US19890353740
申请日期
1989.05.18
申请人
MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
