| 摘要 |
Disclosed are an evaporation method and an evaporator which enable to greatly reduce the number of fine particles scattered in a formed film. The evaporation method is characterized by carrying a material solution to a next step while having the material solution in contact with a heated carrier gas. The evaporator is characterized by comprising a evaporation chamber, a carrier gas channel communicated with the evaporation chamber, a material solution feed port for introducing the material solution into the channel, and a means for heating the carrier gas.
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