发明名称 APPARATUS FOR DEPOSITION OF COATINGS IN VACUUM
摘要 FIELD: coating applying systems, namely apparatuses for deposition of coatings in vacuum, possibly in electrography, machine engineering, radio electronics and other branches of industry. ^ SUBSTANCE: apparatus includes vacuum chamber; temperature -sensitive resistor base evaporator for evaporating easy-to-melt metals and alloys; device for mounting and rotating substrate, magnetron; laser irradiation source for irradiating and evaporating hard-to-melt ferromagnetic and non-ferromagnetic metals and alloys; crucible for evaporating metals and alloys of above mentioned types. Vacuum chamber is provided with window for laser irradiation. Invention allows apply different type coatings in the same working chamber. ^ EFFECT: lowered cost of process for applying coatings onto articles, large assortment of composition coatings with different functions. ^ 1 dwg
申请公布号 RU2271409(C2) 申请公布日期 2006.03.10
申请号 RU20010133169 申请日期 2001.12.06
申请人 发明人 KACHANOV EVGENIJ GRIGOR'EVICH;DERBENEV LEONID VLADIMIROVICH;FEDIN ALEKSANDR VIKTOROVICH
分类号 C23C28/00;C23C14/22 主分类号 C23C28/00
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