发明名称 Radiation-sensitive elements and their storage stability
摘要 Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
申请公布号 US2006051699(A1) 申请公布日期 2006.03.09
申请号 US20050536514 申请日期 2005.05.25
申请人 KODAK POLYCHROME GRAPHICS LLC 发明人 BAUMANN HARALD;FLUGEL MICHAEL;DWARS UDO;KOTTMAIR EDUARD
分类号 G03C1/76;B41C1/10;B41M5/46;G03F7/029 主分类号 G03C1/76
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