发明名称 CHARGED PARTICLE BEAM ADJUSTMENT METHOD AND CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a beam condition adjustment method which is suitable for adjusting beam conditions at tilting of electron beam, and to provide a device that uses the method. SOLUTION: For the tilting angle adjustment for the beam and distortion adjustment for correcting image distortion, occuring at the time of tilting of the electron beam in a charged particle beam device which tilts the beam by a deflection device for tilting, for example, such adjustments are carried out by using a specific specimen such as a pyramid shaped sample; image processing is carried out so as to obtain the value of the tilting angle and distortion amount by acquiring images acquired before and after tilting; and according to a prescribed processing flow, adjustments of the tilting angle and distortion correction are automated. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006066302(A) 申请公布日期 2006.03.09
申请号 JP20040249434 申请日期 2004.08.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 DOI TAKASHI;ARAI NORIAKI;MOROKUMA HIDETOSHI;SETOGUCHI KATSUMI;SASAJIMA JIDAI;TANAKA MAKI;MIYAMOTO ATSUSHI
分类号 H01J37/147;H01J37/153 主分类号 H01J37/147
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