EXPOSURE SYSTEM, SEMICONDUCTOR DEVICE AND PROCESS FOR FABRICATING THE SAME

摘要

In order to link a defect inspection process before forming a contact hole and an exposure process for forming a contact hole, the location (physical coordinate) of a defect on a wafer inspected in the defect inspection process before forming a contact hole is stored and exposure (dummy exposure) is performed in such a manner that no contact hole is formed on the location. Since a contact hole is not formed in a region where a defect exists, a word line (control gate) and a bit line are not short-circuited through the contact hole although a defective cell is produced and the cell can be repaired by the conventional bit line redundancy.