CRYSTALLIZATION APPARATUS AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a crystallization apparatus and method in which melting and crystallizing state of a semiconductor film can be observed in real time, and a growing rate and a direction of the semiconductor film can be measured accurately.

SOLUTION: The crystallization apparatus 1 composed of an optical system 2 for irradiating an amorphous semiconductor film 27 provided on a substrate 26 with energy light and melting and crystallizing the amorphous semiconductor film 27 comprises an optical system 30 arranged on the outside of the optical path of energy light and irradiating illumination light for measurement; an optical element 41 for splitting a measuring light beam into a plurality of measuring light beams; lenses 45A and 45B for focusing each measuring light beam on the light receiving surface of a photodetector as the image of the amorphous semiconductor film 27; a plurality of measuring instruments 50A and 50B each including the photodetector and converting each image on the light receiving surface into crystallization information; and an image processor for processing the crystallization information.

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