| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing liquid composition, providing small surface roughness of a substrate to be polished after polishing and remarkably reducing nonoscratches and also provide a method of manufacturing a substrate having small surface roughness and remarkably reduced nanoscratches. <P>SOLUTION: This polishing liquid composition containing polishing material and water satisfies the following conditions: (1) the filter liquid passing quantity of a bore diameter 0.5μm in a standard test A is 3.7 g/(min, cm<SP>2</SP>) or more; (2) the primary average particle diameter of polishing material is 50 nm or less; and (3) the content of polishing material 2 to 40 wt.%. The method of manufacturing the substrate uses the above polishing liquid composition in a finishing polishing process. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
