ACTIVE RAY-CURABLE HYPERBRANCHED POLYMER AND ACTIVE RAY-CURABLE RESIN COMPOSITION USING SAME

摘要

Disclosed is a resin which is very suitably used as resist and can be sufficiently cured in the exposed portion even when it is irradiated with an active ray of low energy, thereby enabling to obtain a desired developed pattern at high rate. Specifically disclosed is a resin having an unsaturated bond group wherein a photosensitizing group is introduced into a hyperbranched structure. Preferably, the hyperbranched structure is composed of a polycondensation product of an AB<SUB>x</SUB>-type molecule (wherein A and B represent organic groups having different functional groups a and b which are chemically reactive with each other through condensation reaction or addition reaction; and X represents an integer of not less than 2).