发明名称 ELECTRON BEAM DEVICE AND MANUFACTURING METHOD OF DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To improve the performance of an electron beam device used for estimation of a sample. SOLUTION: The electron beam device is composed of an irradiation optical system 10 forming the electron emitted from an electron gun 11 into an electron beam and irradiating the electron beam on a sample face, and an image projection optical system 30 forming an image of the secondary electron emitted from the sample on a detection system. A scintillator converting the image of secondary electron into an optical signal and an optical member 34 are arranged to the image projection optical system. Vacuum side of the optical member is formed into a flat face 341 and the scintillator is mounted on the flat face, and atmospheric side of the optical member is formed into a curved face 342. The optical signal formed at the scintillator is taken out toward atmospheric side through the curved face. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006066181(A) 申请公布日期 2006.03.09
申请号 JP20040246468 申请日期 2004.08.26
申请人 EBARA CORP 发明人 NAKASUJI MAMORU;NOMICHI SHINJI;KAGA TORU;HATAKEYAMA MASAKI;SOFUGAWA TAKUJI;SATAKE TORU;MURAKAMI TAKESHI
分类号 H01J37/244;H01J37/28;H01L21/66 主分类号 H01J37/244
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