发明名称 PATTERN FORMING METHOD USING PHOTOSENSITIVE TRANSFER MATERIAL, PATTERNING SUBSTRATE, AND LIQUID CRYSTAL DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid crystal display by which defective display of an image is prevented, and a pattern forming method for manufacturing the same. <P>SOLUTION: In the pattern forming method including: a step of transferring a photosensitive transfer material having at least one photosensitive resin layer on a temporary support onto a substrate; an exposure step of exposing the photosensitive transfer material in a desired pattern; and a developing step of removing an unnecessary portion by development, wherein the steps are carried out in this order, a substrate heating step of heating the substrate onto which the photosensitive transfer material has been transferred is included between the transfer step and the exposure step. In the pattern forming method, when the at least one photosensitive resin layer contains a naphthoquinonediazido derivative, in the step of transferring the photosensitive transfer material, a substrate temperature is 120-180&deg;C, a roll temperature is 130-160&deg;C, or a conveyance speed is 1-2 m/min. In the pattern forming method, when a thermoplastic resin layer and an intermediate layer are present, a step of removing the thermoplastic resin layer and the intermediate layer is included between the transfer step and the exposure step. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006064765(A) 申请公布日期 2006.03.09
申请号 JP20040244219 申请日期 2004.08.24
申请人 FUJI PHOTO FILM CO LTD 发明人 YOSHINO HARUHIKO;KODAMA TOMOHIRO;ITO HIDEAKI;KUROKI NOBUHIRO
分类号 G03F7/38;G02F1/1337;G03F7/004;G09F9/00 主分类号 G03F7/38
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