发明名称 DRYING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method that allows a super-critical process to be conducted after a liquid process for drying with pattern deformation suppressed. SOLUTION: A transfer tray 103 is raised from a secondary treatment tank 102, the transfer tray 103 is filled with washing water 104, and then a board 111 is soaked into the above washing water 104. Next, isopropanol is poured into the above transfer tray 103 to replace washing water 104 in the transfer tray 103 with isopropanol, and then the transfer tray 103 is filled with isopropanol 105 so that the board 111 can be soaked in the isopropanol 105. Then, the transfer tray is accommodated in the reaction chamber of the super-critical process equipment 106. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006066698(A) 申请公布日期 2006.03.09
申请号 JP20040248305 申请日期 2004.08.27
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 IKUTSU HIDEO
分类号 H01L21/304;F26B5/00;F26B9/06;H01L21/027 主分类号 H01L21/304
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