| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition mask device having high operability and reliability. SOLUTION: The film deposition mask device comprises a spacer 5 having a storage hole, a lower mask 4 which is adhered to a lower side of the spacer while a lower mask pattern for film deposition is formed on a part corresponding to the storage hole, and an upper mask 6 which is adhered to an upper side of the spacer while an upper mask pattern for film deposition is formed on a part corresponding to the storage hole, and further comprises one fixed guide pin 33 which is fixed to a plate surface of a specified member of the film deposition mask device, and at least one slide guide pin 35 mounted so as to slide with respect to the plate surface of the specified member of the film deposition mask device. A guide hole to be fitted to each guide pin is formed in the film deposition device having no fixed guide pin or slide guide pin. COPYRIGHT: (C)2006,JPO&NCIPI
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