Mewthod and device for analysing the surface of a substrate

摘要

The object of the invention is a process for scanning a surface of a substrate ( 2 ), which process consists in taking at least one reflected image of at least one test pattern ( 1 ) on the said surface and extracting by digital processing local phases in two directions, characterized in that variations in local slopes are calculated by digital processing from the local phases in order to deduce therefrom variations in curvature or variations in altitude of the said surface.