Apparatus and method of exposing light to a semiconductor device having a curved surface

摘要

A semiconductor manufacturing station ( 50 ) exposes light on a surface area of a spherical semiconductor device or ball ( 52 ). A mask pattern generator ( 56 ) provides a pattern of light, which undergoes temporal changes to collectively represent an image. The mask pattern generator has an active exposure contour ( 80 ) that provides a portion of the overall image. The pattern of light is directed though a lens ( 62 ) to the surface area of the semiconductor device. The semiconductor device rotates in relation to the temporal changes in the pattern of light to expose the pattern of light over a portion of a surface area of the semiconductor device. The exposure contour has a narrower center and becomes wider moving away from the center. The exposure contour may have a curvature.