Method of manufacturing mask for exposure, mask for exposure, and package body of mask for exposure

摘要

There are provided a method of manufacturing a mask for exposure, which includes the step of patterning a light-shielding film formed on a quartz substrate to form a light-shielding pattern, and the step of directly measuring a step from the surface of the quartz substrate to the top surface of the light-shielding pattern to obtain the actual measurement value of the step.