发明名称 |
POLISHING SLURRY, PRODUCTION METHOD OF GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM AND PRODUCTION METHOD OF INFORMATION RECORDING MEDIUM |
摘要 |
<p>The present invention provides a low-cost polishing slurry having excellent effect with respect to defects and smoothness of the surface to be polished. The polishing slurry comprises a silica abrasive and a ceria abrasive, wherein the silica abrasive content is less than 3 mass% and the ceria abrasive content is less than 1 mass%, based on the entire polishing slurry. Further, the present invention provides a method for producing a crystallized glass substrate for an information recording medium, wherein the method use a polishing slurry of the present invention. Furthermore, the present invention provides a method for producing an information recording medium, comprising forming a recording layer on a crystallized glass substrate for an information recording medium obtained by the present method.</p> |
申请公布号 |
WO2006025539(A1) |
申请公布日期 |
2006.03.09 |
申请号 |
WO2005JP16154 |
申请日期 |
2005.08.29 |
申请人 |
SHOWA DENKO K.K.;AIDA, KATSUAKI;MACHIDA, HIROYUKI;HANEDA, KAZUYUKI |
发明人 |
AIDA, KATSUAKI;MACHIDA, HIROYUKI;HANEDA, KAZUYUKI |
分类号 |
B24B37/00;C03C19/00;C09K3/14;G11B5/84;(IPC1-7):C09K3/14;G11B5/73 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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