发明名称 POLISHING SLURRY, PRODUCTION METHOD OF GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM AND PRODUCTION METHOD OF INFORMATION RECORDING MEDIUM
摘要 <p>The present invention provides a low-cost polishing slurry having excellent effect with respect to defects and smoothness of the surface to be polished. The polishing slurry comprises a silica abrasive and a ceria abrasive, wherein the silica abrasive content is less than 3 mass% and the ceria abrasive content is less than 1 mass%, based on the entire polishing slurry. Further, the present invention provides a method for producing a crystallized glass substrate for an information recording medium, wherein the method use a polishing slurry of the present invention. Furthermore, the present invention provides a method for producing an information recording medium, comprising forming a recording layer on a crystallized glass substrate for an information recording medium obtained by the present method.</p>
申请公布号 WO2006025539(A1) 申请公布日期 2006.03.09
申请号 WO2005JP16154 申请日期 2005.08.29
申请人 SHOWA DENKO K.K.;AIDA, KATSUAKI;MACHIDA, HIROYUKI;HANEDA, KAZUYUKI 发明人 AIDA, KATSUAKI;MACHIDA, HIROYUKI;HANEDA, KAZUYUKI
分类号 B24B37/00;C03C19/00;C09K3/14;G11B5/84;(IPC1-7):C09K3/14;G11B5/73 主分类号 B24B37/00
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