发明名称 |
DESIGNING METHOD OF ILLUMINATION LIGHT SOURCE, MASK PATTERN DESIGNING METHOD, PHOTO MASK MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND PROGRAM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide the designing method of an illumination light source that can make a degree of light exposure margin optimal. <P>SOLUTION: The designing method of an illumination light source comprises steps of setting a management figure to be used for dimensional control of the transfer pattern of a mask pattern, setting a plurality of lighting elements for lighting the mask pattern, setting a first illumination light to a first polarized state of the light emitted from each of the plurality of illumination elements, calculating a first optical image of the management figure formed on a first imaging surface by each of the first illumination lights, and determining an illumination shape of light and a polarized state distribution based on the optical characteristics of the first optical image. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006066440(A) |
申请公布日期 |
2006.03.09 |
申请号 |
JP20040243874 |
申请日期 |
2004.08.24 |
申请人 |
TOSHIBA CORP |
发明人 |
FUKUHARA KAZUYA |
分类号 |
H01L21/027;G03F1/36;G03F1/68;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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