PHASE SHIFT MASK AND EXPOSURE METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask for achieving a large depth of focus when a transparent insulating substrate is exposed to transfer a fine line-and-space pattern.

SOLUTION: The purpose of the phase shift mask is to transfer a line-and-space pattern by an actual size projection exposure using a mask pattern having a phase shifter 11 which inverts the phase of light but without using a light shielding film. When the line-and-space pattern has 0.5 μm to 0.8 μm line width L and 2L pitch, the mask pattern consists of linear phase shifters 11 arranged in parallel to each other with 0.5L to 0.75L width W and 2L pitch P.

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