| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of optimizing a process for use with a plurality of lithography systems. <P>SOLUTION: The method includes a step of determining a calibrated resist model for a given process and a target pattern utilizing a first lithography system, a step of selecting a second lithography system configured with a diffracting optical element having variable parameters for optimizing the performance, a step of simulating the imaging performance of the second lithography system utilizing diffracting optical elements, the calibrated resist model and the target pattern, and a step of optimizing the imaging performance of the diffractive optical element by executing a genetic algorithm. The genetic algorithm identifies the values of the parameter of the diffractive optical element that optimizes the imaging of the target pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
