| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection optical system of charged particle beam capable of obtaining good image formation performance, by optimizing a deflection orbit even in the case that an image rotation angle is other than a non-rotated inverted image in a deflection optical system. <P>SOLUTION: The electron beam transmitted through a subfield 3 in the position distant from an optical axis 2 on a reticle 1 is made to pass nearly along the orbit in alignment with the straight line, which connects the subfield 3 to a target image focus location 5 on the wafer 4 by means of a magnetic deflection device, and thus a projection optical system 6 is optimized under the conditions of passing along this orbit. As described above, it is made possible to reduce easily the aberration as the whole optical system by defining a deflection orbit at the time of projecting the subfield 3 in the position distant from the optical axis. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
