发明名称 SEMICONDUCTOR MANUFACTURING DEVICE, MAINTENANCE METHOD THEREFOR, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To directly and accurately measure a distance between an upper electrode and a lower electrode. SOLUTION: The maintenance method of a semiconductor device includes a step of opposing the upper electrode 12 and the lower electrode 20, and a step of causing a protrusion 22b provided on the lower electrode 20 so that it can appear/disappear to protrude toward the upper electrode 12, bringing the protrusion 22b into contact with the upper electrode 12, and measuring the protruding quantity of the protrusion 22b thereby measuring the distance between the upper electrode 12 and the lower electrode 20. It may include, between the step of opposing the upper electrode 12 and the lower electrode 20 and the step of measuring the distance between the electrodes 12 and 20, a step of mounting a semiconductor substrate 1 on the lower electrode 20 while the protrusion 22b is embedded in the lower electrode 20, and a step of bringing the protrusion 22b into contact with the semiconductor substrate 1, thereby setting a reference point for measuring the distance. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006066678(A) 申请公布日期 2006.03.09
申请号 JP20040247933 申请日期 2004.08.27
申请人 SEIKO EPSON CORP 发明人 TANAKA NOBUYUKI
分类号 H01L21/3065 主分类号 H01L21/3065
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