| 摘要 |
PROBLEM TO BE SOLVED: To provide a photocurable resin composition which has excellent solvent resistance and scratch resistance, and which can give a photocured film having enough hardness from a practical viewpoint. SOLUTION: The photocurable resin composition contains a methacrylic copolymer copolymerized with at least 25% by weight of methyl methacrylate and having unsaturated double bond groups on the side chains, a multi-functional unsaturated monomer, and a photocrosslinking initiator. The photocurable resin composition has enough hardness and moderate stretch from a practical viewpoint after photocured, and can be used effectively as a surface treating agent for various sheet materials, tubes, gaskets, packing, desks, or metal products, cover materials of sound insulating walls or the like. COPYRIGHT: (C)2006,JPO&NCIPI
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