发明名称 SUBSTRATE HOLDER, STAGE APPARATUS, AND EXPOSURE APPARATUS
摘要 <p>A substrate holder holds a substrate in excellent flatness even at the peripheral edge section, surrounding suction space, of the holder. The substrate holder has a peripheral edge section (33) surrounding suction space (38) and a first support section (34) provided in the suction space (38) and supporting a substrate. The substrate holder also has a second support section (7) extending from the peripheral edge section (33) side to the first support section (34) side and supporting the substrate.</p>
申请公布号 WO2006025341(A1) 申请公布日期 2006.03.09
申请号 WO2005JP15687 申请日期 2005.08.29
申请人 NIKON CORPORATION;SHIBAZAKI, YUICHI 发明人 SHIBAZAKI, YUICHI
分类号 H01L21/027;G03F7/20;H01L21/683 主分类号 H01L21/027
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