发明名称 |
SUBSTRATE HOLDER, STAGE APPARATUS, AND EXPOSURE APPARATUS |
摘要 |
<p>A substrate holder holds a substrate in excellent flatness even at the peripheral edge section, surrounding suction space, of the holder. The substrate holder has a peripheral edge section (33) surrounding suction space (38) and a first support section (34) provided in the suction space (38) and supporting a substrate. The substrate holder also has a second support section (7) extending from the peripheral edge section (33) side to the first support section (34) side and supporting the substrate.</p> |
申请公布号 |
WO2006025341(A1) |
申请公布日期 |
2006.03.09 |
申请号 |
WO2005JP15687 |
申请日期 |
2005.08.29 |
申请人 |
NIKON CORPORATION;SHIBAZAKI, YUICHI |
发明人 |
SHIBAZAKI, YUICHI |
分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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