| 摘要 |
PROBLEM TO BE SOLVED: To provide an oxide film formation method capable of easily forming an oxide film, to provide an oxide film formed by the oxide film formation method, and to provide parts and electronic equipment provided with the oxide film. SOLUTION: In the oxide film formation method, an oxide film 3 composed of the oxide of inorganic matter as the main material is formed on the surface of a surface layer 12 (base material) composed of inorganic matter. In this case, an alcohol-containing treatment liquid is fed to the surface of the member 1 to be treated (surface layer 12) to form a liquid film of the treatment liquid, and, in the liquid film 2, through the reaction between the inorganic matter and alcohol, the oxide of the inorganic matter is produced, and further, the treatment liquid remaining in the liquid film 2 is removed, so as to obtain the oxide film 3. COPYRIGHT: (C)2006,JPO&NCIPI
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