| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an abrasive cloth for finish polishing, improving the flatness of a polished material. <P>SOLUTION: A polishing pad has a polyurethane sheet 2 formed of polyurethane resin. A skin layer 4 where foam is densely formed on the polishing surface side is formed on the polyurethane sheet 2. In the polyurethane sheet 2, the back Q of the holding surface P is subjected to buffing so that the thickness of the polyurethane sheet 2 is substantially uniform. In the buffing, after a deposition base material 43 in deposition is separated, projecting and recessed parts emerging on the back Q are removed while the flat surface of a pressure contact roller 65 is pressed to the surface of the holding surface P. A support layer of PET-made film is stuck to the buffed back Q'. The thickness of the polyurethane sheet 2 is substantially uniform, and the skin layer 4 remains intact. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
