| 摘要 |
A method for fabricating a liquid crystal display device includes providing first and second substrates; forming an active layer on the first substrate, wherein the active layer includes a source region, a drain region, a channel region, and a storage region; forming a first insulation layer on the first substrate; forming a gate electrode, a gate line, a pixel electrode, and a storage line on the first substrate, wherein storage line overlaps the storage region; forming a second insulation layer on the first substrate; forming first and second contact holes through the first and second insulation layers, wherein the first and second contact holes expose respective ones of the source and drain regions; forming a pixel hole through the second insulation layer, wherein the pixel hole exposes the pixel electrode; forming a source electrode electrically connected to the source region through the first contact hole and a drain electrode electrically connected to the drain region through the second contact hole; and forming a liquid crystal layer between the first and second substrates.
|
