发明名称 |
Method for fabricating field rings |
摘要 |
A method for fabricating a semiconductor and at least one second semiconductor zone of a semiconductor component having a semiconductor body having a first semiconductor zone. At least one field zone arranged in an edge region of the semiconductor body is reduced in size by means of an etching method. In another embodiment, the semiconductor body is partially removed in a region outside the first semiconductor zone. At least one second semiconductor zone is then fabricated in the partially removed region.
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申请公布号 |
US2006051923(A1) |
申请公布日期 |
2006.03.09 |
申请号 |
US20050207525 |
申请日期 |
2005.08.19 |
申请人 |
FALCK ELMAR;NIEDERNOSTHEIDE FRANZ-JOSEF;SCHULZE HANS-JOACHIM;BARTHELMESS REINER |
发明人 |
FALCK ELMAR;NIEDERNOSTHEIDE FRANZ-JOSEF;SCHULZE HANS-JOACHIM;BARTHELMESS REINER |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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