发明名称 MATERIAL FOR FORMATION OF RESIST PROTECTION FILM AND METHOD OF FORMING RESIST PATTERN THEREWITH
摘要 <P>PROBLEM TO BE SOLVED: To provide a protection film material having high refractive index characteristics which can be used as a protection film material even when a liquid immersion medium having a refractive index higher (for example, &ge;1.5 for exposure light at 193 nm wavelength) than the refractive index of water (about 1.44 for exposure light at 193 nm wavelength). <P>SOLUTION: A protection film is formed on the surface of an employed resist film by using a composition comprising an acrylic resin component with the properties of having substantially no compatibility with a liquid for resist film immersion, in particular, water and being soluble in alkali. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006064711(A) 申请公布日期 2006.03.09
申请号 JP20040228695 申请日期 2004.08.04
申请人 TOKYO OHKA KOGYO CO LTD 发明人 ENDO KOTARO;YOSHIDA MASAAKI;ISHIZUKA KEITA
分类号 G03F7/11;C08F220/04;C08F220/16;G03F7/039;H01L21/027 主分类号 G03F7/11
代理机构 代理人
主权项
地址