Method for deposition onto a substrate and method for producing photo conductor

摘要

A grounded vacuum container is filled, the container containing a plurality of substrates, with a CVD gas. A voltage is applied to the substrates to generate plasma around each of the substrates along with grounding a plurality of ground members arranged at positions opposite to the deposition surface of each of the substrates inside the vacuum container. A coating is deposited onto a plurality of substrates in a method for deposition that attracts ions within the plasma to the substrates and deposits a coating onto the substrates.