| 摘要 |
<p>A method for fabricating a cladded conductor ( 42 ) for use in a magnetoelectronics device is provided. The method includes providing a substrate ( 10 ) and forming a conductive barrier layer ( 12 ) overlying the substrate ( 10 ). A dielectric layer ( 16 ) is formed overlying the conductive barrier layer ( 12 ) and a conducting line ( 20 ) is formed within a portion of the dielectric layer ( 16 ). The dielectric layer ( 16 ) is removed and a flux concentrator ( 30 ) is formed overlying the conducting line ( 20 ).</p> |
