发明名称 |
POSITIVE RESIST COMPOSITION |
摘要 |
According to the present invention, there is provided the following positive resist composition which is excellent in properties such as resolution, profile, depth of focus, etc. and free from scum: a positive resist composition comprising (a) a novolac resin obtained through a condensation reaction of an aldehyde compound and a mixture of phenol compounds comprising m-cresol, p-cresol and 2,5-xylenol, (b) a light-sensitive quinonediazide material containing the quinonediazidesulfonic acid diester of the compound having not less than three phenolic hydroxyl groups in an amount of 40% or more as expressed in terms of pattern area measured by high performance liquid chromatography, and (c) an alkali-soluble compound having a molecular weight of lower than 900.
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申请公布号 |
CA2102148(A1) |
申请公布日期 |
1994.05.12 |
申请号 |
CA19932102148 |
申请日期 |
1993.11.01 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
OSAKI, HARUYOSHI;EBINA, CHINEHITO;MORIUMA, HIROSHI;UETANI, YASUNORI |
分类号 |
G03F7/022;(IPC1-7):G03F7/022;G03F7/039 |
主分类号 |
G03F7/022 |
代理机构 |
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