发明名称 Processing apparatus
摘要 <p>A processing apparatus comprising a plurality of process unit groups (G1 to G5) each including a plurality of process units to subject an object (w) to a series of processes, said process units being arranged vertically in multiple stages, an object transfer space (22) being defined among the process unit groups (G1 to G5); transfer means (21) for transferring the object (w), said transfer means (21) having a transfer member (73, 78a, 78b, 78c) vertically movable in the object transfer space (22), said transfer member (73, 78a, 78b, 78c) being capable of transferring the object (w) to each of said process units; and means (20b, 50 to 62, 84, 95, 95a, 96, 114, 114a, 115, 115a) for reducing a variation in condition of the object transfer space (22), the processing apparatus further comprising at least one first process unit group (G1, G2) in which process units including a resist coating unit for coating a resist and a developing unit for developing a pattern of the resist are vertically stacked; and at least one second process unit group (G3, G4, G5) in which at least one or all of an alignment unit for aligning an object to be processed, a baking unit for baking the object, a cooling unit for cooling the object, an adhesion unit for subjecting the object to an adhesion process, and an extension unit are vertically stacked, wherein said first process unit group (G1, G2) has such an arrangement that the coating unit is placed below the developing unit.</p>
申请公布号 EP1632989(A2) 申请公布日期 2006.03.08
申请号 EP20050023272 申请日期 1997.01.24
申请人 TOKYO ELECTRON LIMITED 发明人 YAEGASHI, HIDETAMI;TOSHIMA, TAKAYUKI;AKIMOTO, MASAMI;YAMAGUCHI, EIJI;KITANO, JUNICHI;KATANO, TAKAYUKI;SHINYA, HIOSHI;IIDA, NAUAKI
分类号 H01L21/00 主分类号 H01L21/00
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