| 摘要 |
<p>A magnetic memory capable of reducing diffusion of ferromagnetic material into semiconductor element area is provided. A magnetic memory 1 includes plural memory areas 3 disposed in two-dimension of m rows and n columns (m, n are integers of 2 or more). The magnetic memory 1 includes semiconductor layer 6 including drain area 32a and source area 32c for write transistor 32, magnetic material layer 8 including TMR element 4 and write wiring 31, and wiring layer 7 including bit wirings 13a and 13b and word wiring 14 being sandwiched between semiconductor layer 6 and magnetic material layer 8. Since wiring layer 7 is sandwiched between magnetic material layer 8 and semiconductor layer 6, the ferromagnetic material diffusing (migrates) from TMR element 4 hardly reaches to semiconductor layer 6. Thus, the diffusion of the ferromagnetic material into the drain area 32a and the source area 32c can be reduced.</p> |
