SINGLE WAFER TYPE DFFUSION FACILITY HAVING THE VACUUM ALIGNER,申请号KR20040070079-传众专利搜索

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发明名称	SINGLE WAFER TYPE DFFUSION FACILITY HAVING THE VACUUM ALIGNER
摘要
申请公布号	KR20060021206(A)	申请公布日期	2006.03.07
申请号	KR20040070079	申请日期	2004.09.02
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	SEOL, HYUN SU
分类号	H01L21/22	主分类号	H01L21/22
代理机构		代理人
主权项
地址

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