发明名称 |
Extending the range of lithographic simulation integrals |
摘要 |
A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.
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申请公布号 |
US7010776(B2) |
申请公布日期 |
2006.03.07 |
申请号 |
US20030694466 |
申请日期 |
2003.10.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GALLATIN GREGG M.;GOFMAN EMANUEL;LAI KAFAI;LAVIN MARK A.;MUKHERJEE MAHARAJ;RAMM DOV;ROSENBLUTH ALAN E.;SHLAFMAN SHLOMO |
分类号 |
G03F1/08;G06F17/50;G03F1/14;H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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