发明名称 Optical position measuring system using an interference pattern
摘要 A position measuring system including a laser light source for radiating a laser beam, an optical lens system for generating an interference pattern on the basis of the laser beam having passed through different optical paths, a detector for detecting the interference pattern, and an arithmetic unit for calculating the position of at least one of the light source and the detector on the basis of a detection signal issued from the detector. For example, a spherical lens can be used as the optical lens system. In this case, the interference pattern is formed on the basis of spherical aberration of the lens. Alternatively, a multifocal lens may be used as the optical lens system.
申请公布号 US7009713(B2) 申请公布日期 2006.03.07
申请号 US20030426632 申请日期 2003.05.01
申请人 FUJI XEROX CO., LTD. 发明人 SEKO YASUJI;HOTTA HIROYUKI
分类号 G01B9/02;G01B11/00;G06F3/033;G06F3/042 主分类号 G01B9/02
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